The following shows our integrated ultra-high vacuum (UHV)
facility for both materials growth and characterization. Our goal is to grow
materials down to single atomic layer thickness and characterize in atomic
resolution. The materials growth system is a laser-assisted molecular beam
epitaxy (MBE) combined with normal mini MBE setup, particularly for the
fabrication of thin films and superstructures of transition-metal oxides. The
characterization system include an Omicron
variable temperature scanning tunneling microscope (VT-STM), a low energy
electron diffraction (LEED-I(V)) optics, x-ray photoelectron spectroscopy (XPS), et al.
Both systems are integrated together under UHV condition.
Without Laser-MBE Chamber
Upgraded with Laser-MBE Chamber
Overview of my current LMBE/STM system
Overview of my group
Jiandi with the graduate students